Thin Films Module Development Engineer
Intel, US, Oregon, Hillsboro
- Pay
- Not listed by the employer
- Work type
- Not stated
- Level
- Not stated
- Area
- Software engineering
- Posted
- Aug 21, 2026
About the role
Job Details:
Job Description:
Intel Foundry is seeking highly motivated Thin Films Metals Module Development Engineers to join the Technology Development (TD) organization to accelerate development of advanced process development for applications in high-k/metal gate, contact, and interconnect. In this role you will be responsible for delivering metals process definition, development, and optimization in metal deposition modules.
Core Responsibilities:
- Primary ownership of thin film metal deposition process development across ALD, CVD, PVD, electrochemical deposition, and related process platforms
- Design, implement, and optimize processes to meet specifications for materials, device performance, yield, and process control
- Design, execute, and analyze experiments to meet integrated device requirements and support rapid yield improvement
- Apply expert knowledge of equipment operating principles, materials characterization and metrology, and device characteristics to accelerate technology development learning cycles
- Support novel material and process screening and evaluation, equipment selection, on-time install/qualification of first-of-kind equipment, and design for manufacturability
- Partner with cross-functional teams including process integration, device engineering, metrology, yield, manufacturing, and equipment suppliers
- Contribute to process pathfinding efforts for next-generation semiconductor technologies through evaluation of novel materials, hardware assessment, process screening, integration development, and silicon validation
Qualifications:
Minimum qualifications are required to be initially considered for this position. Preferred qualifications are in addition to the minimum requirements and are considered a plus factor in identifying top candidates. Requirements listed would be obtained through a combination of industry relevant job experience, internship experiences and or schoolwork/classes/research.
Minimum Qualifications:
- PhD in Materials Science, Chemical Engineering, Electrical Engineering, Mechanical Engineering, Physics, Chemistry, or a closely related STEM field
With at least 1+ years of experience in:
- Working knowledge of one or more thin film deposition technologies such as ALD, CVD, PVD, sputtering, evaporation, electrochemical deposition, or related vacuum process technologies
- Demonstrated ability to analyze process data using statistical methods, structured troubleshooting, and robust experimental design
Preferred Qualifications:
- Experience in thin film metal deposition process development for high-k/metal gate stack, contact metallization, or Cu interconnect barrier/liner/plating
- Experience with materials characterization and metrology methods such as XRF, XPS, XRD, SEM, TEM, ellipsometry, e-test, defect inspection, reliability, and related techniques
Listed on Intel's Workday careers site; checked 3 h ago. First seen by us 3 h ago. Being listed doesn't mean the team is actively interviewing.